CVD (Chemical Vapour Deposition) has established itself as an essential technology in various industrial sectors. This process is used particularly in the semiconductor industry and in the production of photovoltaic modules due to its precision and versatility.
Application of CVD coating in the semiconductor industry
In semiconductor technology, silicon substrates are often coated with layers produced using CVD technology. These layers fulfil the highest quality requirements and are crucial for processes such as crystal growing or molecular beam epitaxy (MBE). Here, metals and other materials are vaporised in an ultra-high vacuum at temperatures of up to 1,500°C. Thanks to CVD coating, it is possible to produce components such as crucibles, dishes and plates made of pyrolytic boron nitride or pyrolytic graphite that can withstand these extreme conditions.
Production of photovoltaic modules with CVD technology
CVD coating is also used successfully in the production of photovoltaic modules. Pyrolytic boron nitride and pyrolytic graphite, which are processed using this method, are used, for example, in the production of active layers in photovoltaic cells. These materials make it possible to produce high-performance and durable modules that meet the increasing demands of the energy transition.
Further areas of application for CVD coating
The versatility of CVD technology is also evident in other industrial applications, such as
- OLED production: production of active layers for organic light-emitting diodes.
- Rare earth cleaning: Precise separation and purification of metals.
- Crystal growing processes: Vertical and horizontal Bridgman methods as well as the LEC process benefit from the high-quality coatings.